PROCESSING FLUID SUPPLY DEVICE, SUBSTRATE PROCESSING DEVICE, PROCESSING FLUID SUPPLY METHOD, SUBSTRATE PROCESSING METHOD, PROCESSING FLUID PROCESSING DEVICE, AND PROCESSING FLUID PROCESSING METHOD

摘要

A processing fluid supply device (100) is a processing fluid supply device (100) for discharging processing fluid from a discharge opening (53) and supplying this processing liquid to an article (W) being processed. The device includes: a first pipe (51) that is a first pipe (51) within which processing fluid can flow and the inside thereof is connected to the discharge opening (53); and an x-ray irradiation means (62) that irradiates the processing fluid present within the first pipe (51) with x-rays. The first pipe (53) has an opening (52) in the pipe wall thereof, and the opening (52) is closed with a window member (71) formed using materials through which x-rays can pass. The x-ray irradiation means (62) irradiates x-rays through the window member (71) into the processing fluid present within the first pipe (51).