发明名称 ENVIRONMENTAL SYSTEM INCLUDING EVACUATION FOR LIQUID IMMERSION LITHOGRAPHIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an environmental system for controlling the environment of a gap between an optical assembly and a device.SOLUTION: A fluid barrier (254) is positioned closely to a device (30), and a liquid immersion fluid system (252) delivers a liquid immersion fluid (248) filling a gap (246). The liquid immersion fluid system (252) recovers a liquid immersion fluid existing directly between the fluid barrier (254) and the device (30). The fluid barrier (254) may include a discharge inlet positioned closely to the device (30), and the liquid immersion fluid system (252) may include a low pressure source communicating with the discharge inlet. An environmental system (26) includes a bearing fluid source for directing a bearing fluid between the fluid barrier (254) and the device (30), so that the fluid barrier (254) is supported for the device (30).
申请公布号 JP2014060457(A) 申请公布日期 2014.04.03
申请号 JP20130272247 申请日期 2013.12.27
申请人 NIKON CORP 发明人 HAZELTON ANDREW J;SOGARD MICHAEL
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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