| 摘要 |
Disclosed is a nano-imprinting device and method for high-brightness LED patterning. The device comprises: a wafer bearing platform (1), a vacuum sucking disc (2), a substrate (3), an ultraviolet light curable nano-imprinting resistant (4) etc., wherein a mould (5) is a thin film elastic composite soft mould, which comprises a patterning layer (501) and a supporting layer (502), wherein the pattern layer has characteristics, such as water solubility, a thin-film structure, elasticity and a high transparency, and the mould is manufactured by a roll-imprinting process. The method for achieving the LED patterning based on the device comprises the steps of: (1) a pre-treatment process, (2) an imprinting process, (3) a curing process, (4) a demoulding process, (5) a post-treatment process; and (6) transferring of the imprinted pattern. The device and the method achieve manufacturing a large area and high aspect ratio micro-nano structure on a non-flat surface or a curved-surface substrate or a fragile substrate efficiently and with low cost, are suitable for the large-scale manufacture of optical devices, three-dimensional minicells, MEMS devices, photovoltaic devices, anti-reflecting layers, self-cleaning surfaces, etc., and are especially suitable for the LED patterning and the industrial-grade large-scale production of wafer level splicing-free micro-optical devices. |
