发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 An AlGaN/GaN HEMT includes: a compound semiconductor layer; a source electrode and a drain electrode formed on an upper side of the compound semiconductor layer; and an Al—Si—N layer being a high-resistance layer disposed in a lower portion of at least one of the source electrode and the drain electrode and higher in an electric resistance value than the source electrode and the drain electrode.
申请公布号 US2014092635(A1) 申请公布日期 2014.04.03
申请号 US201313968828 申请日期 2013.08.16
申请人 FUJITSU LIMITED;FUJITSU SEMICONDUCTOR LIMITED 发明人 KAMADA YOUICHI;KIUCHI KENJI
分类号 H01L29/778;H01L29/66;H02M3/335 主分类号 H01L29/778
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