| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING TOUCH PANEL |
| 摘要 |
<p>A photosensitive resin composition for ITO etching use, which comprises a binder polymer, a photopolymerizable compound, a photopolymerization initiator and a silane coupling agent, wherein the silane coupling agent comprises a silane compound having a mercaptoalkyl group.</p> |
| 申请公布号 |
WO2014050567(A1) |
申请公布日期 |
2014.04.03 |
| 申请号 |
WO2013JP74559 |
申请日期 |
2013.09.11 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
TAMADA HARUHISA;KIMURA NORIYO;TAKASAKI TOSHIHIKO |
| 分类号 |
G03F7/075;G03F7/004;G03F7/027;G03F7/40;G06F3/041 |
主分类号 |
G03F7/075 |
| 代理机构 |
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