METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To form a thin film, such as a silicon film, containing a predetermined element in a low temperature region.SOLUTION: A thin film formed with a predetermined element, is formed on a substrate by performing a cycle of steps a predetermined number of times, the cycle including: a step of supplying a first raw material including predetermined elements and halogen group to a substrate; and a step of supplying a second raw material including predetermined element and amino group, having two or less ligands which includes amino group in its composition formula and in which its number of is less than that of ligand including halogen group in a composition formula of the first raw material.