发明名称 |
METHOD FOR FABRICATION OF NANO-STRUCTURES |
摘要 |
Methods of fabricating nano-structures on a substrate surface are provided including the use of small initial pilot nano-structures patterned in a writing layer which are enlarged upon transfer to a pattern transfer layer among process layers applied to the substrate material, before removal of the writing layer to reveal the enlarged nano-structures. Enlarged nano-structures are transferred to the substrate by etch techniques to produce desired final enlarged nano-structures in the substrate surface. Raised out of plane and etched-in-plane nano-structures may be produced. Multiple geometries, configurations and spacings of 2D (such as in-plane nano-structures) and/or 3D (such as out of plane nano-structures) nano-structures and/or grids or arrays thereof may be fabricated on a surface of a substrate according to a single fabrication process. |
申请公布号 |
WO2014047740(A1) |
申请公布日期 |
2014.04.03 |
申请号 |
WO2013CA50740 |
申请日期 |
2013.09.27 |
申请人 |
IDIT TECHNOLOGIES CORP. |
发明人 |
CHUO, YINDAR;LANDROCK, CLINTON K.;OMRANE, BADR;KAMINSKA, BOZENA |
分类号 |
G03F1/38;B82Y40/00 |
主分类号 |
G03F1/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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