发明名称 COMPOUND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A compound semiconductor device includes: a compound semiconductor layer; a protective insulating film that covers a top of the compound semiconductor layer and has an opening formed thereon; and an electrode that fills the opening, that is brought into contact with the compound semiconductor layer, and that is formed on the protective insulating film, in which an orientation state of a contact portion between the electrode and the compound semiconductor layer and an orientation state of a contact portion between the electrode and the protective insulating film are the same.
申请公布号 US2014091424(A1) 申请公布日期 2014.04.03
申请号 US201313943427 申请日期 2013.07.16
申请人 FUJITSU LIMITED 发明人 MAKIYAMA KOZO
分类号 H01L29/778;H01L29/66 主分类号 H01L29/778
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