发明名称 |
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD FOR OPERATING THE SAME, AND EUV PROJECTION EXPOSURE APPARATUS |
摘要 |
<p>A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer (32) which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body (34). In this case, at least one mirror (32) of the plurality of mirrors has at least one layer (36) comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror.</p> |
申请公布号 |
WO2014016168(A9) |
申请公布日期 |
2014.04.03 |
申请号 |
WO2013EP65000 |
申请日期 |
2013.07.16 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
BITTNER, BORIS;WABRA, NORBERT;SCHNEIDER, SONJA;SCHNEIDER, RICARDA;WAGNER, HENDRIK;ILIEW, RUMEN;PAULS, WALTER |
分类号 |
G03F7/20;G02B7/00;G02B17/06;G21K1/06 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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