Illumination system for projection exposure apparatus, has optical system comprising linear light conductance that is transverse to folding plane, and folding mirror arranged in vicinity of field or pupil plane

摘要

The system (10) has an optical system (5) that is arranged with respect to front area of a beam propagation to be illuminated at a reticle (7) in which a folding mirror (2) is arranged. The optical system has a linear light conductance in a folding plane, which is greater than or equal to 5 mm and/or has a linear light conductance that is transverse to the folding plane, which is greater than or equal to 18 mm. The folding mirror is arranged in vicinity of a field or a pupil plane and arranged at an angle of 45 degrees to a Z-axis.