发明名称 SELF-CONTAINED IRRIGATION POLISHING SYSTEM
摘要 A self-contained water polishing system includes at least a first containment basin that has an inlet for inflow of water from a collection source and contains calcium carbonate for treatment of water flowing through the system; at least a first polishing basin in communication with the containment basin and that contains at least a first pollutant collection substrate for treatment of water flowing through the system; and a vacuum pumping system in fluid communication with the containment and polishing basins that draws water through the polishing system.
申请公布号 CA2886085(A1) 申请公布日期 2014.04.03
申请号 CA20132886085 申请日期 2013.09.26
申请人 WASSERWERK, INC. 发明人 HAWKS, WAYNE R.
分类号 C02F1/00;C02F1/66;C02F9/02 主分类号 C02F1/00
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