发明名称 METHOD FOR FORMING WIRING PATTERN, AND WIRING PATTERN FORMATION
摘要 A wiring pattern formation and a method for forming a wiring pattern characterized in that a first, second, and third step are performed in sequence. The first step is a step for laminating a resist layer (200) on a non-wired section (104) of a first surface (101) of an insulating substrate (100), the second step is a step for laminating an electroconductive thin film layer (300) on a wiring section (103) and at least part of the resist layer (200), and the third step is a step for radiating flash light (401) in the visible light band from a flash bulb (400) onto a second surface (202) of the resist layer (200) from a second surface (102) of the insulating substrate (100), dissolving the resist layer (200), and forming a wiring pattern made of the electroconductive thin film layer (300) on the wiring section (103). Provided is a new method for forming a wiring pattern which does not require complex steps such as using chemical substances such as etching liquids or resist peeling liquids, and which is environmentally and economically effective.
申请公布号 WO2014050421(A1) 申请公布日期 2014.04.03
申请号 WO2013JP73136 申请日期 2013.08.29
申请人 TORAY INDUSTRIES, INC. 发明人 NINOMIYA HIROKAZU;ITO KIYOHIKO;KAWABATA YUSUKE
分类号 H05K3/02;G03F7/20;H01L21/027 主分类号 H05K3/02
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