| 摘要 |
<p>Provided is a vapor deposition device constructed so as to enable a substrate and a vapor deposition mask to be moved relative to each other while at a distance from each other, and having a low-cost and lightweight mask frame, and with which replacement of the vapor deposition mask and the like can be performed quite easily, and with which a rise in temperature can be suppressed so that there is no deviation in the deposition pattern due to a temperature rise, thus enabling highly precise vapor deposition to be performed. This vapor deposition device is constructed such that a substrate (4), which is maintained at a distance from a vapor deposition mask (2) provided on a mask holder (6), is moved relative to an evaporation source (1) and the mask holder (6), which is equipped with dispersion restriction parts that restrict the direction in which evaporation particles are dispersed, thereby performing vapor deposition in a range wider than the vapor deposition mask (2). In addition, the mask holder (6) is constructed so as to be divided into a mask frame (6A), on which the vapor deposition mask (2) is provided, and a mask frame holder (6B), which is equipped with the dispersion restriction parts and a temperature control mechanism (9), and is constructed such that the mask frame (6A), which is arranged in contact with the mask frame holder (6B), can be detached and removed therefrom.</p> |
