发明名称 COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND
摘要 A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof—CO—,—COO—,—O—,—NR′—,—CS—,—S—,—SO—,—SO2—or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.
申请公布号 US2014093826(A1) 申请公布日期 2014.04.03
申请号 US201314032528 申请日期 2013.09.20
申请人 JSR CORPORATION 发明人 MINEGISHI SHINYA;TANAKA KIYOSHI;KUSABIRAKI KAZUNORI
分类号 G03F7/11;G03F7/20 主分类号 G03F7/11
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