发明名称 |
METHOD FOR PHOTON ABLATION OF A TARGET AND COATING METHOD |
摘要 |
The invention relates in general level to radiation transference techniques as applied for utilization of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a scanner or an improved scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material. |
申请公布号 |
EP2137336(B1) |
申请公布日期 |
2014.04.02 |
申请号 |
EP20080718536 |
申请日期 |
2008.02.22 |
申请人 |
PICODEON LTD OY |
发明人 |
RUUTTU, JARI;MYLLYMAEKI, VESA;LAPPALAINEN, REIJO;PULLI, LASSE;MAEKITALO, JUHA;YLAETALO, SAMPO |
分类号 |
C23C14/28;B23K26/02;H01J37/32 |
主分类号 |
C23C14/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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