发明名称 METHOD FOR PHOTON ABLATION OF A TARGET AND COATING METHOD
摘要 The invention relates in general level to radiation transference techniques as applied for utilization of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a scanner or an improved scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material.
申请公布号 EP2137336(B1) 申请公布日期 2014.04.02
申请号 EP20080718536 申请日期 2008.02.22
申请人 PICODEON LTD OY 发明人 RUUTTU, JARI;MYLLYMAEKI, VESA;LAPPALAINEN, REIJO;PULLI, LASSE;MAEKITALO, JUHA;YLAETALO, SAMPO
分类号 C23C14/28;B23K26/02;H01J37/32 主分类号 C23C14/28
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