发明名称 |
Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method |
摘要 |
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like. |
申请公布号 |
US8686098(B2) |
申请公布日期 |
2014.04.01 |
申请号 |
US201013375026 |
申请日期 |
2010.05.20 |
申请人 |
MORI KAZUNORI;HAGIWARA YUJI;NAGAMORI MASASHI;ISONO YOSHIMI;NARIZUKA SATORU;MAEDA KAZUHIKO;CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MORI KAZUNORI;HAGIWARA YUJI;NAGAMORI MASASHI;ISONO YOSHIMI;NARIZUKA SATORU;MAEDA KAZUHIKO |
分类号 |
C08F12/20;C07C69/34;C08F216/12;G03F7/004;G03F7/40 |
主分类号 |
C08F12/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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