发明名称 |
Solid-state imaging device, fabrication method thereof, imaging apparatus, and fabrication method of anti-reflection structure |
摘要 |
A fabrication method of an anti-reflection structure includes the steps of: forming a resin film having micro-particles dispersed therein on a surface of a substrate; forming a protrusion dummy pattern on the resin film by etching the resin film using the micro-particles in the resin film as a mask while gradually etching the micro-particles; and forming a protrusion pattern on the surface of the substrate by etching back the surface of the substrate together with the resin film having the protrusion dummy pattern formed thereon, and transferring a surface shape of the protrusion dummy pattern formed on a surface of the resin film to the surface of the substrate. |
申请公布号 |
US8685856(B2) |
申请公布日期 |
2014.04.01 |
申请号 |
US20100728448 |
申请日期 |
2010.03.22 |
申请人 |
MAEDA KENSAKU;KOIKE KAORU;SASAKI TOHRU;TATSUMI TETSUYA;SONY CORPORATION |
发明人 |
MAEDA KENSAKU;KOIKE KAORU;SASAKI TOHRU;TATSUMI TETSUYA |
分类号 |
H01L31/0236 |
主分类号 |
H01L31/0236 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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