| 摘要 |
The semiconductor device includes a memory cell including a plurality of magnetoresistive elements disposed therein, and a peripheral circuit region disposed around the memory cell region. The magnetoresistive element includes a magnetization fixed layer, a magnetization free layer, and a tunneling insulation layer. The semiconductor device includes, above the magnetoresistive elements, a plurality of first wires extending in the direction along the main surface. In the peripheral circuit region, there is disposed a multilayer structure of lamination of a layer equal in material to the magnetization free layer, a layer equal in material to the tunneling insulation layer, and a layer equal in material to the magnetization fixed layer so as to overlap a second wire formed of the same layer as the first wire in plan view. The multilayer structure does not overlap both of a pair of adjacent second wires in plan view in the peripheral circuit region. |
