部份真空环境下之压印,申请号TW096111836-传众专利搜索

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发明名称	部份真空环境下之压印
摘要
申请公布号	TWI432311	申请公布日期	2014.04.01
申请号	TW096111836	申请日期	2007.04.03
申请人	分子压模公司美国	发明人	齐雷拉　安雪曼;莱德　班克杰Ｂ. LAD, PANKAJ B. US;麦马金　伊恩Ｍ. MCMACKIN, IAN M. US;崔炳镇
分类号	B29C59/02;G03F7/00	主分类号	B29C59/02
代理机构		代理人	恽轶群台北市松山区南京东路3段248号7楼;陈文郎台北市松山区南京东路3段248号7楼
主权项
地址	美国

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