发明名称 Low irritancy cleansing compositions
摘要 Composition A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group; each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group and wherein at least one of R2, R3, R4 and R5 is not hydrogen and M+ represents a cation; (b) an amphoteric surfactant; and (c) an alkoxylated non-ionic species; wherein the molar ratio of component (a) to component (b) is from 0.5:1 to 2:1 and wherein the ratio of the mass of component (c) to the combined mass of components (a) and (b) is less than 1.2:1.
申请公布号 US8685906(B2) 申请公布日期 2014.04.01
申请号 US201013386706 申请日期 2010.08.02
申请人 COTRELL PHILIP;INNOSPEC LIMITED 发明人 COTRELL PHILIP
分类号 C11D1/02 主分类号 C11D1/02
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