| 摘要 |
PURPOSE: A coating method of a surface of a mold for nanoimprint lithography with an anti-adhesive material is provided to provide high accuracy and contact angle for a mold of high steps or a micro mold with a period of 100 nm or less. CONSTITUTION: A coating method of a surface of a mold for nanoimprint lithography comprises: a step of conducting surface oxidation by reacting with basic oxide etchant; a step of attaching a weld surface of APTES of -OH(hydroxyl) group of a surface of a mold by reacting the mold with 3-aminopropyl triethoxysilane solution; and a step of reacting the mold with monoglycidyl ether terminated polydimethylsiloxane solution, and attaching PDMS material to the APTES as an anti-adhesive material. |
