发明名称 |
Anordning och förfarande för bearbetning av ett substrats yta |
摘要 |
The invention is related to an apparatus and a method for processing a surface of a substrate by exposing the surface of the substrate to alternating surface reactions of at least a first starting material and a second starting material according to the principles of atomic layer deposition method. According to the invention a first starting material is fed on the surface of the substrate locally by means of a source by moving the source in relation to the substrate, and the surface of the substrate processed with the first starting material is exposed to a second starting material present in the atmosphere surrounding the source. |
申请公布号 |
FI124113(B) |
申请公布日期 |
2014.03.31 |
申请号 |
FI20100005901 |
申请日期 |
2010.08.30 |
申请人 |
BENEQ OY |
发明人 |
SOININEN, PEKKA;SNECK, SAMI |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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