发明名称 METHOD OF GROWING GROUP III NITRIDE CRYSTALS
摘要 The present invention provides a method of growing an ingot of group III nitride. Group III nitride crystals such as GaN are grown by the ammonothermal method on both sides of a seed to form an ingot and the ingot is sliced into wafers. The wafer including the first-generation seed is sliced thicker than the other wafers so that the wafer including the first-generation seed does not break. The wafer including the first-generation seed crystal can be used as a seed for the next ammonothermal growth.
申请公布号 US2014087113(A1) 申请公布日期 2014.03.27
申请号 US201313834015 申请日期 2013.03.15
申请人 SEOUL SEMICONDUCTOR CO., LTD.;SIXPOINT MATERIALS, INC. 发明人 HASHIMOTO TADAO;LETTS EDWARD;HOFF SIERRA
分类号 H01L29/20;C30B7/10;C30B29/40 主分类号 H01L29/20
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