PHOTOSENSITIVE RESIN COMPOSITION

摘要

Provided is a photosensitive resin composition which has high film retention ratio after development and high sensitivity, while having a uniform surface after the development. A positive photosensitive resin composition which contains: (a) a polymer that contains a structural unit represented by general formula (1) as a main component; (b) a quinonediazide compound; and (c) a phenolic resin having a specific structure. (In formula (1), each of R1 and R2 independently represents a divalent to octavalent organic group having 2-60 carbon atoms; each of R3, R4, R5 and R6 independently represents a hydrogen atom or a monovalent organic group having 1-20 carbon atoms; each of d and e independently represents an integer of 0-2, provided that d and e are not 0 at the same time; each of f and g independently represents an integer of 0-4; and n represents a positive integer.)