PLASMA ETCHING APPARATUS AND MASK DEVICE

摘要

Disclosed are a plasma etching device and a mask device. The plasma etching device processes plasma etching on a board and comprises: a stage fixing the board; and a mask being arranged as forming space with the board on the board and protecting the non-etching range of the board. One side of the board and the mask vertical to the dispersion direction of rare gas injected in the space comprises the structure of preventing emission of the rare gas in the vertical direction. [Reference numerals] (AA) Radical; (BB,CC) Argon gas