PRODUCTION METHOD OF TEMPLATE FOR NANOIMPRINT LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a production method of a template for nanoimprint lithography, by which generation of defects can be decreased and increase in a production time or production cost can be suppressed.SOLUTION: A light-transmitting substrate is used, in which a mesa-like step structure is preliminarily formed on one major surface and a recessed part is formed on the other major surface, with the recessed part overlapping the mesa-like step structure in a plan view and having an area larger than the mesa-like step structure. A resist pattern is formed by electron beam drawing or laser drawing on an upper surface of the mesa-like step structure.