Methods and compositions for etching polysilicon including aqueous compositions containing nitric acid and ammonium fluoride, and apparatus formed thereby.
申请公布号
US2014087551(A1)
申请公布日期
2014.03.27
申请号
US201213624272
申请日期
2012.09.21
申请人
IMONIGIE JEROME A.;RAGHU PRASHANT;MICRON TECHNOLOGY, INC.
