发明名称 |
EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren Dafuer |
摘要 |
The invention relates to extreme ultraviolet“EUV”radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus. |
申请公布号 |
US2014084186(A1) |
申请公布日期 |
2014.03.27 |
申请号 |
US201313834108 |
申请日期 |
2013.03.15 |
申请人 |
TRUMPF LASER- UND SYSTEMTECHNIK GMBH;TRUMPF LASER- UND SYSTEMTECHNIK GMBH |
发明人 |
LAMBERT MARTIN;ENZMANN ANDREAS |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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