| 发明名称 |
HIGH POWER IMPULSE MAGNETRON SPUTTERING METHOD PROVIDING ENHANCED IONIZATION OF THE SPUTTERED PARTICLES AND APPARATUS FOR ITS IMPLEMENTATION. |
| 摘要 |
<p>Method for performing a HIPIMS coating process, whereby a minimal distance 5 between target and substrate is reduced till achieving an essentially maximal bias current at substrate during coating process, and thereby improving considerably coating quality and increasing deposition rate in comparison with conventional HIPIMS coating processes.</p> |
| 申请公布号 |
MX2013012200(A) |
申请公布日期 |
2014.03.27 |
| 申请号 |
MX20130012200 |
申请日期 |
2012.04.16 |
| 申请人 |
OERLIKON TRADING AG, TRÜBBACH |
发明人 |
MARKUS LECHTHALER |
| 分类号 |
C23C14/35;C23C14/34;C23C14/56;H01J37/34 |
主分类号 |
C23C14/35 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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