发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition having high heat-resistant adhesiveness and moisture heat-resistant adhesiveness and giving a cured product that exhibits high transparency and high hardness.SOLUTION: The photosensitive composition comprises the following components (1) to (4): (1) a radical initiator (A); (2) an acid generator (B) and/or a base generator (C); (3) a polymerizable substance (D); and (4) a polysiloxane compound (E) having a specified chemical structure. In the composition, at least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates an active species (H) by irradiation with active rays; the active species (H) reacts with (A), (B) or (C) to generate a new active species (I); and (I) promotes a polymerization reaction of the polymerizable substance (D). (H) or (I) is an acid or base. The composition does not substantially contain any of a colorant, a metal oxide powder and a metal powder. (D) comprises an ester compound (D1) having a specified composition and a polyfunctional (meth)acrylate monomer (D2).
申请公布号 JP2014056123(A) 申请公布日期 2014.03.27
申请号 JP20120201019 申请日期 2012.09.12
申请人 SANYO CHEM IND LTD 发明人 TASHIRO TAKAYUKI
分类号 G03F7/027;G03F7/004;G03F7/029;G03F7/031;G03F7/075;H01L21/027 主分类号 G03F7/027
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