Micro-mechanical or micro-electromechanical device for projection exposure system such as extreme UV (EUV) projection exposure system, has temperature control device that is provided with gas supply unit and gas exhaust unit

摘要

The micro-electromechanical device has a multi-shed mirror assembly (1) which is provided with several mirrors having mirror element (2). The rod (3) is arranged central to mirror element. A copper block is located on mirror element. The magnet is provided below the mirror element. The temperature control device e.g. cooling device is provided with gas supply unit (7) and gas exhaust unit (8). Independent claims are included for the following: (1) projection exposure system; (2) method for operation of micro-mechanical or micro-electromechanical device; and (3) method for operation of projection exposure system.