发明名称 METHOD FOR MANUFACTURING RESIN LAYER HAVING PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method capable of keeping excellent pattern forming properties when a pattern is repeatedly formed even if a mold release property is not imparted to a mold when a resin layer having a pattern is formed by an imprint method.SOLUTION: A method for manufacturing a resin layer having a pattern comprises the steps of: irradiating a resin layer 10a composed of a resin composition with light; pressing a mold 5 having an uneven pattern against the resin layer 10a irradiated with light to form a pattern inverted to the uneven pattern on the resin layer 10a; and removing the mold 5 from a resin layer 10b in which a pattern is formed.
申请公布号 JP2014056975(A) 申请公布日期 2014.03.27
申请号 JP20120201712 申请日期 2012.09.13
申请人 HITACHI CHEMICAL CO LTD 发明人 NARITA MASAO;KATO SADAAKI
分类号 H01L21/027;B29C59/02;C08F283/04 主分类号 H01L21/027
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