发明名称 |
METHOD FOR MANUFACTURING RESIN LAYER HAVING PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of keeping excellent pattern forming properties when a pattern is repeatedly formed even if a mold release property is not imparted to a mold when a resin layer having a pattern is formed by an imprint method.SOLUTION: A method for manufacturing a resin layer having a pattern comprises the steps of: irradiating a resin layer 10a composed of a resin composition with light; pressing a mold 5 having an uneven pattern against the resin layer 10a irradiated with light to form a pattern inverted to the uneven pattern on the resin layer 10a; and removing the mold 5 from a resin layer 10b in which a pattern is formed. |
申请公布号 |
JP2014056975(A) |
申请公布日期 |
2014.03.27 |
申请号 |
JP20120201712 |
申请日期 |
2012.09.13 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
NARITA MASAO;KATO SADAAKI |
分类号 |
H01L21/027;B29C59/02;C08F283/04 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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