发明名称 GATE CONTACT STRUCTURE OVER ACTIVE GATE AND METHOD TO FABRICATE SAME
摘要 Gate contact structures disposed over active portions of gates and methods of forming such gate contact structures are described. For example, a semiconductor structure includes a substrate having an active region and an isolation region. A gate structure has a portion disposed above the active region and a portion disposed above the isolation region of the substrate. Source and drain regions are disposed in the active region of the substrate, on either side of the portion of the gate structure disposed above the active region. A gate contact structure is disposed on the portion of the gate structure disposed above the active region of the substrate.
申请公布号 WO2014046856(A1) 申请公布日期 2014.03.27
申请号 WO2013US57116 申请日期 2013.08.28
申请人 INTEL CORPORATION 发明人 PETHE, ABHIJIT JAYANT;GHANI, TAHIR;BOHR, MARK;WEBB, CLAIR;GOMEZ, HARRY;CAPPELLANI, ANNALISA
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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