APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR OPERATING THE SAME

摘要

The present invention relates to an apparatus for processing a substrate and a processing method thereof, and more particularly, to an apparatus for processing the substrate by activating process gas and a processing method thereof. An embodiment of the present invention includes a chamber including an inner space in which a substrate is processed; a top lid provided at a top portion of the chamber and provided therein with at least one gas introduction hole; a substrate support member rotatably installed in the inner space to support the substrate; a central spray unit provided at a top portion of the substrate support member to spray gas into a central region of the substrate support member; a gas sprayer including a plurality of gas spray units provided around the central spray unit to spray the gas to the substrate support member; and an optical treatment part disposed between the gas spray units to perform optical treatment with respect to the substrate, and the optical treatment part includes a window unit to transmit light and a light lamp disposed ona top portion of the window unit to supply the light onto the substrate.