| 摘要 |
PROBLEM TO BE SOLVED: To inhibit the deterioration of the exposure accuracy due to electrostatic charge of a substrate or the like.SOLUTION: An exposure device 100 includes: a wafer stage WST including a holding part which may hold a substrate W and a liquid-repellent upper surface enclosing the holding part; a mixing device for mixing a predetermined substance, in which specific resistance changes, with a liquid Lq; and a liquid immersion device 132 which supplies the liquid, in which the predetermined substance is mixed, to an area between a projection optical system PL and the wafer stage WST through a liquid supply nozzle 131A thereby forming a liquid immersion region. |
