发明名称 METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a group III nitride crystal including a process for removing a material deposited in a reaction chamber during a crystal growth efficiently.SOLUTION: A method for producing a group III nitride crystal 11 comprises: a step for cleaning a reaction chamber 110 by introducing HCl gas 1 in the reaction chamber 110; and a step for growing a group III crystal 11 doped with O atoms and Si atoms by a vapor growth in the cleaned reaction chamber 110, in which the group III nitride crystal 11 includes a facet growth region and a C plane growth region and the oxygen concentration of the facet growth region is 1.2×10cmor less.
申请公布号 JP2014055103(A) 申请公布日期 2014.03.27
申请号 JP20130229570 申请日期 2013.11.05
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KASAI HITOSHI;OKAHISA TAKUJI;FUJITA SHUNSUKE;MATSUMOTO NAOKI;IJIRI HIDEYUKI;SATO FUMITAKA;MOTOKI KENSAKU;NAKAHATA SEIJI;UEMATSU KOJI;HIROTA TATSU
分类号 C30B29/38;C23C16/34;C30B25/02;H01L21/205 主分类号 C30B29/38
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