发明名称 |
METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a group III nitride crystal including a process for removing a material deposited in a reaction chamber during a crystal growth efficiently.SOLUTION: A method for producing a group III nitride crystal 11 comprises: a step for cleaning a reaction chamber 110 by introducing HCl gas 1 in the reaction chamber 110; and a step for growing a group III crystal 11 doped with O atoms and Si atoms by a vapor growth in the cleaned reaction chamber 110, in which the group III nitride crystal 11 includes a facet growth region and a C plane growth region and the oxygen concentration of the facet growth region is 1.2×10cmor less. |
申请公布号 |
JP2014055103(A) |
申请公布日期 |
2014.03.27 |
申请号 |
JP20130229570 |
申请日期 |
2013.11.05 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
KASAI HITOSHI;OKAHISA TAKUJI;FUJITA SHUNSUKE;MATSUMOTO NAOKI;IJIRI HIDEYUKI;SATO FUMITAKA;MOTOKI KENSAKU;NAKAHATA SEIJI;UEMATSU KOJI;HIROTA TATSU |
分类号 |
C30B29/38;C23C16/34;C30B25/02;H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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