| 摘要 |
A cleansing agent composition comprising: (A) a sulfonate-type surfactant and/or a sulfate-type anionic surfactant; and (B) a heterocyclic compound represented by formula (1) (wherein R1 and R2 independently represent a hydrogen atom, a methyl group, a hydroxymethyl group or a hydroxyethyl group). The cleansing agent composition has high cleansing performance and a low irritating property, can prevent skin from being dried out after the skin is cleaned with the composition and then dried, and can be used suitably in a cosmetic product. |
