发明名称 CELL DESIGN
摘要 One or more techniques or systems for designing a cell are provided. The cell generally includes one or more transistors, such as a pass gate transistor, a pull up transistor, or a pull down transistor, respectively associated one or more gate to gate distances. In some embodiments, a second gate to gate distance is selected based on a first gate to gate distance. For example, the first gate to gate distance and the second gate to gate distance are associated with a first transistor. In another example, the first gate to gate distance is associated with a first transistor and the second gate to gate distance is associated with a second transistor. In this manner, a cell design is provided to improve a static noise margin (SNM) or a write margin (WM) for the cell, for example.
申请公布号 US2014084374(A1) 申请公布日期 2014.03.27
申请号 US201213623978 申请日期 2012.09.21
申请人 SEMICONDUCTOR MANUFACTURING COMPANY LIMITED TAIWAN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED 发明人 HUANG CHIA-EN;TSAI YI-HUNG;CHIU CHIH-CHIEH;YANG HSIAO-LAN;HUANG I-HAN;DAI CHUN-JIUN;WU FU-AN;CHENG HONG-CHEN;YANG JUNG-PING;LEE CHENG HUNG
分类号 G06F17/50;H01L27/088 主分类号 G06F17/50
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