| 摘要 |
<p>A substrate treatment device, according to one embodiment of the present invention, comprises: a process unit in which a process for processing a substrate is performed; a loading port having an accommodation container in which the substrate is accommodated; a frame which is provided in between the process unit and the loading port, and which has an internal space; an internal container which has an accommodation space that communicates with the internal space and an inlet through which the substrate is inputted and outputted from the accommodation space, and which has a plurality of discharge holes on a rear surface that faces the inlet; an external container provided on the outer side of the internal container, and which forms a discharge space that communicates with the accommodation space through the discharge holes; an exhaustion hole which is formed on the external container, and which communicates with the discharge space; and an exhaustion line which is connected to the exhaustion hole, and which has an exhaustion pump for forcibly exhausting the accommodation space.</p> |
