| 摘要 |
According to one embodiment of the present invention, disclosed are a transparent electroconductive thin film composition, a method for forming a transparent electroconductive thin film using the same, and a transparent electroconductive thin film manufactured thereby. The transparent electroconductive thin film composition includes indium (In), gallium (Ga), boron (B), zinc (Zn), and oxygen (O2), wherein the ratio of the indium, gallium, boron, and zinc, (In+Ga)/(In+Ga+B+Zn), is 25 to 65 atomic percent and boron content is 4-8 atomic percent. |
