| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thinning processing method for dry film resist capable of uniformly thinning the dry film resist. <P>SOLUTION: The thinning processing method for dry film resist includes sticking the dry film resist onto a substrate, rinsing in water, and thinning with an aqueous alkali solution containing 5-20 mass% of an inorganic alkaline compound. <P>COPYRIGHT: (C)2011,JPO&INPIT |
