METHOD FOR FABRICATING POLYCRYSTALLINE SILICON THIN FILM NANO STRUCTURE USING AG NANO PARTICLE, POLYCRYSTALLINE SILICON NANO STRUCTURE FABIBRICATED BY THE SAME AND POLYCRYSTALLINE SILICON THIN FILM SOLAR CELL INCLUDING POLYCRYSTALLINE SILICON NANO STRUCTURE

摘要

An embodiment of the present invention relates to a method for forming a nano structure of a polycrystalline silicon thin film through an Ag nanoparticle, a polycrystalline silicon nano structure manufactured by the same and a polycrystalline silicon thin film solar cell comprising the same. The objective of the present invention is to allow a polycrystalline silicon thin film formed on a low price substrate to have a polycrystalline silicon nano structure having a high aspect ratio through an Ag nanoparticle. To achieve the objective, an embodiment of the present invention discloses the method for forming a nano structure of a polycrystalline silicon thin film through an Ag nanoparticle comprising: a substrate preparation step for preparing a substrate; a polycrystalline silicon layer formation step for depositing a polycrystalline silicon layer on the substrate; a metal pattern layer formation step for forming a metal pattern layer having a certain pattern on the polycrystalline silicon layer; a polycrystalline silicon nano structure formation step for forming a polycrystalline silicon nano structure by etching the polycrystalline silicon layer and the metal pattern layer in a first etching process; and a metal pattern layer removal step for removing the metal pattern layer on the polycrystalline silicon nano structure through a second etching process. [Reference numerals] (AA) Start; (BB) End; (S100) Prepare a substrate; (S200) Form a polycrystalline silicon layer; (S300) Form a metal pattern layer; (S400) Form a polycrystalline silicon nano structure; (S500) Remove the metal pattern layer