| 摘要 |
A solid-state imaging device and an electronic device that includes the solid-state imaging device prevents shifting of a photoelectric conversion region due to long-wavelength light passing to subsurface portions of the solid-state imagine device. The device include a photo diode having an upper layer of a first conductivity type formed over a second layer having an accumulation region of a second conductivity type. The upper layer is a light-receiving portion of the photodiode. A multi-stage element isolation layer is included and has a plurality of layers of the first conductivity type, such that a first lateral side of a first stage of the multi-stage layer abuts the accumulation portion, and a second stage of the multi-stage layer is separated by a width W from the accumulation region of an intermediate portion of a second conductivity type. |
