发明名称 SPLIT GATE FIELD EFFECT TRANSISTOR
摘要 A split gate field effect transistor device. The device includes a split gate structure having a trench, a gate electrode and a source electrode. A first poly layer is disposed within the trench and is connected to the gate electrode. A second poly layer connected to the source electrode, wherein the first poly layer and the second poly layer are independent.
申请公布号 EP2491592(A4) 申请公布日期 2014.03.26
申请号 EP20100825637 申请日期 2010.10.20
申请人 VISHAY-SILICONIX 发明人 TERRILL, KYLE;YANG, GAO;PARK, CHANHO
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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