发明名称 OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 <p>The present invention relates to an optical element which comprises a multi-layer antireflective film (optical inorganic thin film) (16) on an optical element substrate (10). A first layer (starting from the closest side to the optical element substrate: the same shall apply hereafter.) of the optical inorganic thin film is a vapor-deposited film (hereinafter called "specified vapor-deposited film") composed of either 1) a mixture or compound of La oxide and Ti oxide, or 2) a mixture or compound of La oxide and Ta oxide and shows a refractive index n D =1.95-2.25. In addition, a final layer is to be a vapor-deposited film comprising SiO 2 , and a middle layer composed of a single or multi-layered vapor-deposited film which comprises one metal oxide selected from a group consisting of ITO (indium tin oxide) and oxides of Group 4 and 5 elements in the fourth to sixth periods is included in the inner side of the final layer. This optical element hardly develops initial swelling while a high degree of heat resistance is maintained.</p>
申请公布号 EP2711741(A1) 申请公布日期 2014.03.26
申请号 EP20110865942 申请日期 2011.05.17
申请人 ITOH OPTICAL INDUSTRIAL CO., LTD. 发明人 SAITO, YUJI;SHIMIZU, TAKEHIRO;ODA, HIROFUMI;KATO, HIROHISA
分类号 G02B1/11;B32B9/00;G02B1/10;G02C7/02 主分类号 G02B1/11
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