发明名称 Nanoimprinting method and method for producing substrates utilizing the nanoimprinting method
摘要 Droplets of resist material are coated using the ink jet method under conditions that: the viscosity of the resist material is within a range from 8 cP to 20 cP, the surface energy of the resist material is within a range from 25 mN/m to 35 mN/m, the amount of resist material in each of the droplets is within a range from 1 pl to 10 pl, and the placement intervals among the droplets are within a range from 10μm to 1000μm. A mold is pressed against the surface of the substrate in a He and/or a depressurized atmosphere such that: an intersection angle formed between a main scanning direction of the ink jet method and the direction of the lines of the linear pattern of protrusions and recesses, which is an intersection angle when pressing the mold against the surface of the substrate, is within a range from 30� to 90�.
申请公布号 US8679357(B2) 申请公布日期 2014.03.25
申请号 US201313848461 申请日期 2013.03.21
申请人 FUJIFILM CORPORATION 发明人 WAKAMATSU SATOSHI;OMATSU TADASHI
分类号 C23F1/02;B82Y40/00 主分类号 C23F1/02
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