发明名称 Hafnium amide complex manufacturing method and hafnium-containing oxide film
摘要 Disclosed is a method of producing a hafnium amide complex represented by general formula: Hf(NR4R5)4, characterized by comprising: carrying out a reduced-pressure distillation after a lithium alkylamide represented by general formula: Li(NR4R5) is added to and allowed to react with a tertiary hafnium alkoxide complex represented by general formula: Hf[O(CR1R2R3)]4. (In the formulas, R1, R2 and R3 independently represent either a phenyl group, a benzyl group, or a primary, secondary or tertiary alkyl group having a carbon number 1-6; and R4 and R5 independently represent either a methyl group or an ethyl group; however, a case where all of R1, R2 and R3 are methyl groups, and a case where one of R1, R2 and R3 is an ethyl group and the other two are methyl groups are excluded.)
申请公布号 US8680308(B2) 申请公布日期 2014.03.25
申请号 US200913129490 申请日期 2009.11.11
申请人 RYOKAWA ATSUSHI;YAMADA SHUHEI;CENTRAL GLASS COMPANY, LIMITED 发明人 RYOKAWA ATSUSHI;YAMADA SHUHEI
分类号 C07F7/00 主分类号 C07F7/00
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