发明名称 Gallium nitride based light emitting diode
摘要 A light emitting diode (LED) capable of improving brightness by forming a InGaN layer having a low concentration of indium, and whose lattice constant is similar to that of an active layer of the LED, is provided. The LED includes: a buffer layer disposed on a sapphire substrate; a GaN layer disposed on the buffer layer; a doped GaN layer disposed on the GaN layer; a GaN layer having indium disposed on the GaN layer; an active layer disposed on the GaN layer having indium; and a P-type GaN disposed on the active layer. Here, an empirical formula of the GaN layer having indium is given by In(x)Ga(1−x)N and a range of x is given by 0<x<2, and a thickness of the GaN layer having indium is 50-200Å.
申请公布号 US8680571(B2) 申请公布日期 2014.03.25
申请号 US201313939845 申请日期 2013.07.11
申请人 LG INNOTEK CO., LTD. 发明人 KIM SEONG JAE
分类号 H01L29/24;H01L27/15;H01L29/06;H01L29/22;H01L29/26;H01L31/0328;H01L31/0336;H01L31/072;H01L31/109;H01L31/12;H01L33/00;H01L33/32 主分类号 H01L29/24
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