发明名称 Epitaxial structure and method for making the same
摘要 A method for making an epitaxial structure includes: (a) providing a sacrificial layer on a temporary substrate, the sacrificial layer being made of gallium oxide; and (b) growing epitaxially an epitaxial layer unit over the sacrificial layer.
申请公布号 US8680554(B2) 申请公布日期 2014.03.25
申请号 US201113331530 申请日期 2011.12.20
申请人 WUU DONG-SING;HORNG RAY-HUA;TSAI TSUNG-YEN;NATIONAL CHUNG-HSING UNIVERSITY 发明人 WUU DONG-SING;HORNG RAY-HUA;TSAI TSUNG-YEN
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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