发明名称 |
Tunable two-mirror interference lithography system |
摘要 |
A two-beam interference lithography system offers large-area nanopatterning with tunability of pattern periodicities. The tunable feature is achieved by placing two rotatable mirrors in the two expanded beam paths which can conveniently be regulated for the designed pattern periodicities. While the effective interference pattern coverage is mainly determined by the optical coherence length and mirror size, the minimum pattern coverage area is as large as the effective coherence length of the laser and the selected mirror size over a wide range of periodicities. |
申请公布号 |
US8681315(B2) |
申请公布日期 |
2014.03.25 |
申请号 |
US201213547824 |
申请日期 |
2012.07.12 |
申请人 |
MAO WEIDONG;WATHUTHANTHRI ISHAN;CHOI CHANG-HWAN;THE TRUSTEES OF THE STEVENS INSTITUTE OF TECHNOLOGY |
发明人 |
MAO WEIDONG;WATHUTHANTHRI ISHAN;CHOI CHANG-HWAN |
分类号 |
G02B7/198 |
主分类号 |
G02B7/198 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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